The Skin Exposure Reduction Paste Against Chemical Warfare Agents (SERPACWA) is indicated for the use in conjunction with Mission Oriented Protective Posture (MOPP) gear to reduce or delay the absorption of chemical warfare agents through the skin when SERPACWA is applied prior to exposure.
SERPACWA was not tested for protection against chemical warfare agents in humans.
One clinical study was conducted to evaluate SERPACWA's effectiveness in the reduction of the severity of dermatitis associated with continuous contact with urushiol (poison ivy resin) in 50 healthy volunteers with history of sensitivity to urushiol. Not all treated individuals were completely protected from the reaction, and the development of dermatitis varied among test subjects. However, results indicated that SERPACWA-treated skin sites exhibited fewer effects of dermatitis due to the urushiol than did the untreated sites.
Another study was performed to determine whether perspiration prevented the effectiveness of the product. SERPACWA was applied to certain sites of the skin of 37 normal volunteers. The participants were then exposed to conditions which promoted active perspiration. Finally, the participants were exposed to the dermal irritant/vasodilator methyl nicotinate for 2 minutes. Results showed that there was substantially less cutaneous vasodilation at the treated sites than at the non-treated sites. Again, the effects were variable among participants and not all individuals were completely protected from the irritant.
In clinical studies SERPACWA was only left in place for a maximum of five hours. In studies, no adverse effects were associated with SERPACWA use.
Information for Personnel:
After the product is applied, if exposure to CWA is confirmed or suspected, follow the appropriate protocol for decontamination.
SERPACWA serves as a physical barrier that may reduce or delay exposure of skin to chemical warfare agents (CWA). SERPACWA has no other known action.
Visit Mitretek Systems' overview of the Background on Chemical Warfare.